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The effect of annealing temperature and time on synthesis of graphene thin films by rapid thermal annealing
dc.creator | Prekodravac, Jovana | |
dc.creator | Marković, Zoran | |
dc.creator | Jovanović, Svetlana P. | |
dc.creator | Budimir, Milica D. | |
dc.creator | Perusko, Davor | |
dc.creator | Holclajtner-Antunović, Ivanka | |
dc.creator | Pavlović, Vladimir | |
dc.creator | Syrgiannis, Zois | |
dc.creator | Bonasera, Aurelio | |
dc.creator | Todorović-Marković, Biljana | |
dc.date.accessioned | 2020-12-17T21:12:59Z | |
dc.date.available | 2020-12-17T21:12:59Z | |
dc.date.issued | 2015 | |
dc.identifier.issn | 0379-6779 | |
dc.identifier.uri | http://aspace.agrif.bg.ac.rs/handle/123456789/3685 | |
dc.description.abstract | In this paper, we performed synthesis of graphene thin films by rapid thermal annealing (RTA) of thin nickel copper (Ni/Cu) layers deposited on spectroscopic graphite as a carbon source. Furthermore, we investigated the effect of annealing temperature and annealing time on formation and quality of synthesized graphene films. Raman spectroscopy study showed that annealing at lower temperatures results in formation of monolayer graphene films, while annealing at higher temperatures results in formation of multilayer graphene films. We used Raman mapping to determine the distribution of graphene sheets. Surface morphology of graphene thin films was investigated by atomic force microscopy and scanning electron microscopy with EDS probe. | en |
dc.publisher | Elsevier Science Sa, Lausanne | |
dc.relation | info:eu-repo/grantAgreement/MESTD/Basic Research (BR or ON)/172003/RS// | |
dc.rights | restrictedAccess | |
dc.source | Synthetic Metals | |
dc.subject | Thin films | en |
dc.subject | Graphite | en |
dc.subject | Graphene | en |
dc.subject | Rapid thermal annealing | en |
dc.title | The effect of annealing temperature and time on synthesis of graphene thin films by rapid thermal annealing | en |
dc.type | article | |
dc.rights.license | ARR | |
dc.citation.epage | 467 | |
dc.citation.other | 209: 461-467 | |
dc.citation.rank | M22 | |
dc.citation.spage | 461 | |
dc.citation.volume | 209 | |
dc.identifier.doi | 10.1016/j.synthmet.2015.08.015 | |
dc.identifier.scopus | 2-s2.0-84940873487 | |
dc.identifier.wos | 000364245900066 | |
dc.type.version | publishedVersion |